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Beilstein J. Nanotechnol. 2016, 7, 1698–1708, doi:10.3762/bjnano.7.162
Figure 1: (a) Scheme of the experiment performed to measure the electrical resistance under perpendicular mag...
Figure 2: Cross-sectional SEM micrographs of a sample with 60 nm pitch (a), a sample with 100 nm pitch (b) an...
Figure 3: Scanning transmission electron microscopy (STEM) study of the sample with pitch 100 nm. (a) STEM-HA...
Figure 4: (a) Magnetoresistance curves of the sample with 100 nm pitch at 1.9 K (0.43Tc), 2.2 K (0.49Tc), 2.5...
Figure 5: Magnetoresistance curves at 2.5 K of the flat sample, and samples with 60, 80, 100, 120 and 140 nm ...
Figure 6: Dependence of the magnetic fields where local minima in the resistance are experimentally observed,...
Figure 7: Comparison of the critical current density and the resistance versus magnetic field of the sample w...
Figure 8: Magnetoresistance measurements for the sample with pitch 60 nm and values of T0 obtained from the f...